Technostress operationalised as information and communication technology (ICT) demands among managers and other occupational groups: Results from the Swedish Longitudinal Occupational Survey of Health (SLOSH)Show others and affiliations
Number of Authors: 62021 (English)In: Computers in human behavior, ISSN 0747-5632, E-ISSN 1873-7692, Vol. 114, article id 106486Article in journal (Refereed) Published
Abstract [en]
Exposure to technostress operationalised as ICT demands is more prevalent in higher socioeconomic groups, but little is known about the exposure in different occupational groups considering industry and position. The aim of the present study was to explore the exposure to ICT demands in managers and other occupational groups. Cross-sectional self-reported data from the Swedish Longitudinal Occupational Survey of Health (SLOSH), collected in 2016 was used, including 13 572 respondents (1 241 'managers', 12 331 'non-managers'). ICT demands based on a six-item Likert scale were analysed as the main measure. 'Managers' (varying industries and positions) in comparison with 'non-managers', including nine occupational groups separated by industry and education level, showed the highest prevalence (74.7%) of ICT demands. 'Managers in health care, other community services and education' showed the highest odds ratio (OR) with 95% Confidence Intervals (CI) of ICT demands, in comparison with 'non-managers' (OR 4.64 [CI 3.26-6.61], and with 'all other managers' (OR 1.55 [CI 1.01-2.38]), after adjustment for sex, age, job strain, and social support. In conclusion, managers have increased odds of exposure to ICT demands, especially managers in health care, other community services and education. Targeted actions to improve the digitalised work environment among managers are warranted.
Place, publisher, year, edition, pages
2021. Vol. 114, article id 106486
Keywords [en]
technostress, occupational group, industry, position, SLOSH
National Category
Psychology
Research subject
Psychology
Identifiers
URN: urn:nbn:se:su:diva-188091DOI: 10.1016/j.chb.2020.106486ISI: 000580937800002OAI: oai:DiVA.org:su-188091DiVA, id: diva2:1515940
2021-01-112021-01-112022-02-25Bibliographically approved