Nanoscale Electron Beam Damage Studied by Atomic Force Microscopy
2009 (English)In: The Journal of Physical Chemistry C, ISSN 1932-7447, E-ISSN 1932-7455, Vol. 113, no 43, 18441-18443 p.Article in journal (Refereed) Published
High-resoln. SEM (HRSEM) has recently been added to the arsenal of characterization tools for material scientists to observe nanoscale surface features on both conducting and insulating materials. It is now therefore crucial to understand whether the intense electron beam will damage the features of interest. The authors were able, for the 1st time, to measure and quantify this damage using a combination of HRSEM and at. force microscopy (AFM), and as a consequence, the bulk of the damage, expressed as a depression on the crystal surface, is confined primarily to a subsurface vol. Simulations demonstrate that the depth of the depression is proportional to the interaction vol. of impact electrons below the crystal surface. More importantly, the nanometer surface features are conserved, and there is negligible assocd. loss of the crit. information in nanoscopic surface topog. These results confirm the usefulness of HRSEM as a tool for surface anal. not only for scientists studying crystal growth but also for materials scientists analyzing any surface at the nanoscale.
Place, publisher, year, edition, pages
2009. Vol. 113, no 43, 18441-18443 p.
Research subject Materials Chemistry
IdentifiersURN: urn:nbn:se:su:diva-35413DOI: 10.1021/jp907245zISI: 000270911500001OAI: oai:DiVA.org:su-35413DiVA: diva2:287438