Effect of lateral morphology formation of polymer blend towards patterning silane-based SAMs using selective dissolution method
2008 (English)In: Ultramicroscopy, ISSN 0304-3991, E-ISSN 1879-2723, Vol. 108, no 5, 458-464 p.Article in journal (Refereed) Published
A number of strategies have been developed including soft lithography and photolithography for patterning various surfaces. Here we have discussed a customized strategy for surface patterning of nanosized, silane-based SAMs and monolayer thickness measurement investigated using atomic force microscope (AFM). We have utilized the versatile morphology of a binary polymer blend to generate patterned SAMs over silicon substrate by employing a selective dissolution procedure. This method was confirmed with different organosilanes with varying number of C-atoms and to other polymer blend. The samples were imaged both in tapping mode and pulsed force mode AFM.
Place, publisher, year, edition, pages
2008. Vol. 108, no 5, 458-464 p.
atomic force microscopy (AFM), self-assembled monolayers, blends, surfaces, thin films
IdentifiersURN: urn:nbn:se:su:diva-58540DOI: 10.1016/j.ultramic.2007.07.006ISI: 000255378500010OAI: oai:DiVA.org:su-58540DiVA: diva2:420946
authorCount :22011-06-072011-06-032011-06-07Bibliographically approved