Patterns of assembled colloidal particles can form on substrates due to solvent evaporation, and here we studied such phenomena in the drying of monodispersed colloidal hydrochar dispersions prepared by the hydrothermal carbonization of glucose and purified by dialysis. During the evaporation of water, line patterns or, in some cases, mud-like patterns formed. The line formation was investigated as a function of the pH of the dispersion, substrate shape, particle concentration, and concentration of sodium dodecylsulfate (SDS). The lines comprised dense assemblies of hydrochar particles. The line width increased with the successive evaporation of water. Sharper lines formed with the addition of SDS, which was ascribed to the effects of solubilization or moderated interactions. At greater particle concentrations, we also observed a continuous layer of colloidal particles between the lines. A mechanism for the line pattern formation derived from the literature on other colloids was proposed. Mud-like patterns formed on the substrate in concentrated samples without SDS addition and were put in the context of the formation of cracks in the drying of colloidal coatings. Hydrochars belong to carbon-rich colloids, which are of fundamental and technological importance. This research could be useful for in situ line printing within microfluidic devices, for example.