At-wavelength metrology of an X-ray mirror using a downstream wavefront modulator
Number of Authors: 32024 (English)In: Journal of Synchrotron Radiation, ISSN 0909-0495, E-ISSN 1600-5775, Vol. 31, no 3, p. 432-437Article in journal (Refereed) Published
Abstract [en]
At-wavelength metrology of X-ray optics plays a crucial role in evaluating the performance of optics under actual beamline operating conditions, enabling in situ diagnostics and optimization. Techniques utilizing a wavefront random modulator have gained increasing attention in recent years. However, accurately mapping the measured wavefront slope to a curved X-ray mirror surface when the modulator is downstream of the mirror has posed a challenge. To address this problem, an iterative method has been developed in this study. The results demonstrate a significant improvement compared with conventional approaches and agree with offline measurements obtained from optical metrology. We believe that the proposed method enhances the accuracy of at-wavelength metrology techniques, and empowers them to play a greater role in beamline operation and optics fabrication.
Place, publisher, year, edition, pages
2024. Vol. 31, no 3, p. 432-437
Keywords [en]
X-ray mirror, speckle, metrology
National Category
Other Physics Topics Other Physics Topics
Identifiers
URN: urn:nbn:se:su:diva-232408DOI: 10.1107/S1600577524002157ISI: 001226268600002PubMedID: 38587895Scopus ID: 2-s2.0-85192422596OAI: oai:DiVA.org:su-232408DiVA, id: diva2:1889617
Conference
PhotonMEADOW23 , Trieste, Italy, 12-14 September, 2024
2024-08-162024-08-162024-08-16Bibliographically approved